TPF Ingeniería obtains ISO 56001 certification, reinforcing its leadership in innovation
AENOR recognizes more than 15 years of systematic work in R&D&I management
TPF Ingeniería has obtained ISO 56001:2024 certification for Innovation Management Systems from AENOR, joining the small group of engineering consultancies in Spain that hold this international recognition.
A pioneering global standard
ISO 56001 is the first certifiable standard worldwide to establish requirements for implementing, maintaining, and improving an innovation management system. It was developed by the international committee ISO/TC 279, in which AENOR has actively participated.
A track record that goes back years
TPF's path toward this certification did not begin now. Back in 2009, the company certified its R&D&I management system in accordance with the UNE 166002 standard, laying the foundations for a structured approach to innovation management that today takes a further step forward with ISO 56001. For TPF, this new certification validates over a decade of work in the structured management of R&D&I projects, digital transformation, and the incorporation of emerging technologies — from artificial intelligence applied to technical documentation to digital twins for infrastructure — within its engineering processes.
"Innovation is not chance, it's method"
TPF Ingeniería has highlighted that this recognition:
"Is not an endpoint, but confirmation that innovation in engineering is not chance, it's method."
Taking the leap to an international standard, moreover, "allows us to speak the same language of innovation as our clients and global partners."
A rigorous framework for continued innovation
AENOR's certification provides a systematic framework for identifying, developing, and deploying new technological solutions in the company's engineering projects, strengthening its competitiveness in a sector that increasingly demands digitalization, sustainability, and forward-looking capability.
All of this in line with its purpose: Building the world, better.